5n High Purity Alumina for Sapphire Crystal Growth

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Introduction:

High purity alumina as a good material, ultraviolet, visible, infrared and microwave has a good transmittance, is the main raw material for sapphire production.

Application

Sapphire single crystal of large size has few internal defects, no scattering sources such as grain boundary and pore, little loss of strength and high wave penetration rate. It is the preferred material for wave penetration components at present. Because sapphire electrical insulation, transparent, easy heat conduction, high hardness, so can be used as an integrated circuit substrate material, can be widely used in LED and microelectronic circuits, so as to replace the high price of silicon nitride substrate, the production of ultra-high-speed integrated circuits.In addition, sapphire can be used as optical sensors and other optical communication and waveguide devices.Such as high temperature and high pressure or vacuum container observation window, LCD projector cooling panel, harmful gas detector and fire monitor window, optical fiber communication connector box, etc.

Production method

High purity ultrafine alumina powder was prepared by aluminum and isopropanol and catalyst synthesis, purification, hydrolysis and calcination.Purification is also divided into distillation and rectification, distillation of lower purity than rectification. Firstly, aluminum isopropyl alcohol was added to aluminum isopropyl alcohol for reaction, and then aluminum isopropyl was distilled and purified by refining, hydrolyzed to aluminum hydrate, and aluminum hydrate was decomposed by heating. The purity of alumina produced by this method is up to 5N.

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