Rare earth polishing slurry

CMP technology is currently the only ultra-precision surface manufacturing method that can provide global flattening.

In the future, advanced technology industry will play an increasingly important role. Cerium oxide based rare earth polishing powder because of its polishing efficiency high, workpiece surface quality, long service life, wide application range and other excellent performance, become today's most popular precision polishing materials.

In recent years, with the rapid development of electronic information technology industry, rare earth polishing powder demand for rare earths continues to increase, leading to increased consumption and a sharp rise in rare earth prices, along with the rare earth. With the price of polishing powder rising, people pay more and more attention to improving the polishing efficiency of rare earth. Therefore, preparation of high quality and efficient rare earth polishing fluid, improve the material removal rate of rare earth polishing powder and polishing surface quality has heavy to the research value.